Abstract :
Amorphous and microcrystalline GaN thin films have been made by reactive sputtering. The dark conductivity can be changed largely from 10−11 S/cm of amorphous GaN to 10−3 S/cm of microcrystalline GaN with a crystalline size of 700 Å. Photoconductivity and persistent photoconductivity (PPC) are observed above room temperature in these films. And a thin film transistor (TFT) was made by using GaN film and observed the operation as a TFT.