Title of article :
Suppression of secondary electrons from diamond by whisker formation
Author/Authors :
S.W. Lee، نويسنده , , Y.J. Baik، نويسنده , , C.J. Kang، نويسنده , , D. Jeon، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2003
Pages :
4
From page :
265
To page :
268
Abstract :
We have studied the secondary electron emission from chemical-vapor-deposited diamond films after etching the surface with an oxygen plasma. The etching not only removed hydrogen from the surface but also formed nano-sized diamond whiskers on the surface. As a result, the secondary electron emission yield was halved. The trap of the secondary electrons by the porous medium was the reason for the decreased emission yield. The morphological effect to the secondary electron emission is discussed.
Keywords :
Whisker , Secondary electron emission , Dry etching , Diamond film
Journal title :
Applied Surface Science
Serial Year :
2003
Journal title :
Applied Surface Science
Record number :
998707
Link To Document :
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