Title of article
Metal epitaxy depending on the growth temperature during deposition
Author/Authors
K. Umezawa، نويسنده , , T. Ito، نويسنده , , S. Nakanishi، نويسنده , , W.M. Gibson، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
5
From page
102
To page
106
Abstract
Time of flight impact-collision ion scattering (TOF-ICISS) has been used to investigate the heteroepitaxial growth of 3 ML of Au or Ag on Ni(1 1 1), and Ag on Cu(1 1 1) over a wide temperature range from 170 through 680 K. We found that two different types of epitaxial growth exist: M(1 1 1)[1 1 2̄]/Sub(1 1 1)[1 1 2̄] (normal mode) and M(1 1 1)[1 1 2]//Sub(1 1 1))[1 1 2̄] (reverse mode) (M represents Au or Ag, and Sub represents Ni or Cu, respectively). Moreover the relative amounts of these two growth modes show an observed oscillatory dependence on the growth temperature during metal deposition. It is our belief that this is previously unobserved phenomena. It is sufficiently general to encompass metal-on-metal systems.
Keywords
Epitaxial growth , Low energy ion beam scattering (LEIS) , nickel , Silver , copper , Surface alloy , Gold
Journal title
Applied Surface Science
Serial Year
2003
Journal title
Applied Surface Science
Record number
998906
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