Title of article :
Oxygen passivation and reactivation of interface states introduced
during Schottky diode fabrication on bulk n-type 6H–SiC
Author/Authors :
E. van Wyk*، نويسنده , , A.W.R. Leitch، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
Typical and deviant Au or Au–Ge Schottky diodes fabricated via thermal (resistive) metallization on bulk 6H–SiC are boiled
in 17.8 M O deionized water. Boiling of the typical devices (shown elsewhere to contain the p1-, p1*-, p2-, p3-, p5-, and possibly
the t1-related defects—where p5 and t1 are associated with a band of interface states) results in passivation of the interface states.
Passivation is accompanied by a reduction in the measure of reverse leakage current associated with the devices. A process of
elimination is shown to establish oxygen as the passivating species. Through annealing experiments significant reactivation of
the passivated defects is shown to commence at some temperature between 350 and 400 8C beyond which reactivation is
accelerated. It is shown that boiling deviant devices (additionally containing the unusual p4-related defect) in deionized water
does not result in passivation. This finding is ascribed to the presence of an interfacial blocking layer peculiar to the deviant
devices.
# 2003 Elsevier B.V. All rights reserved.
Keywords :
Oxygen , Metal–semiconductor interfaces , Schottky barrier , Interface states , silicon carbide
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science