Title of article :
Optical properties of stacked Ge/Si quantum dots with different spacer thickness grown by chemical vapor deposition
Author/Authors :
Wen-Yen Chen، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
4
From page :
148
To page :
151
Abstract :
Photoluminescence spectroscopy has been used to study the optical properties of multiple stacked Ge/Si quantum dots (QDs) with different thickness of Si spacers inserted between the Ge dot layers. According to the emission energy of the stacked Ge/Si QDs, we found that thinner spacer will lead to significant material intermixing. Such intermixing degrades the interface sharpness and the hole confinement depth of the dots. The thermal activation energy of PL intensity quenching for different spacer thicknesses also confirms this finding.We point out that thinner spacer is in fact detrimental to the emission properties of the stacked Ge/Si QDs. To obtain better luminescence efficiency at room temperature, the influence of the material intermixing on stacked Ge/Si QDs should be minimized. # 2003 Elsevier B.V. All rights reserved
Keywords :
strain relaxation , Material intermixing , QDs , germanium , Quantum dot
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999177
Link To Document :
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