Title of article :
Nonvolatile memory based on Ge/Si hetero-nanocrystals
Author/Authors :
H.G. Yang، نويسنده , , Y. Shi*، نويسنده , , L. Pu، نويسنده , , R. Zhang، نويسنده , , B. Shen، نويسنده , , P. Han، نويسنده , , S.L. Gu، نويسنده , , Y.D. Zheng، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
5
From page :
394
To page :
398
Abstract :
Time characteristics have been simulated numerically both for n- and p-channel memory based on Ge/Si hetero-nanocrystals. Owing to the advantages of the staircase potential barrier and the higher band offset on valence band, the retention time of the memory could achieve the increase of several orders while the programming time still hold the same order approximately, compared with the memory based on Si nanocrystals. Therefore, the present memory device would be expected to solve the contradiction between high-speed programming and long retention time. If so, this type of device would be a promising nonvolatile memory for future VLSI. # 2003 Elsevier B.V. All rights reserved
Keywords :
Ge/Si , Hetero-nanocrystals , Nonvolatile memory
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999226
Link To Document :
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