Title of article :
The comparison of isolation technologies and device models
on SiGe bipolar low noise amplifier
Author/Authors :
W.-C. Hua، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
Junction isolation is promising for cost reduction and high power circuit applications due to its relatively lower fabrication
complexity and thermal conductivity, but larger area and collector-substrate capacitance (Ccs) seem drawbacks as compared to
the deep trench isolation (DTI) technology. A simulation work is proposed for the size selection guide of unit cell to have the low
cost benefit of junction isolation without sacrificing the gain and noise performance of the low noise amplifier (LNA) operated at
5.2 GHz.
# 2003 Elsevier B.V. All rights reserved.
Keywords :
SiGe , low noise amplifier , Deep trench isolation , Junction isolation , Mextram 504
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science