Title of article
The comparison of isolation technologies and device models on SiGe bipolar low noise amplifier
Author/Authors
W.-C. Hua، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
4
From page
425
To page
428
Abstract
Junction isolation is promising for cost reduction and high power circuit applications due to its relatively lower fabrication
complexity and thermal conductivity, but larger area and collector-substrate capacitance (Ccs) seem drawbacks as compared to
the deep trench isolation (DTI) technology. A simulation work is proposed for the size selection guide of unit cell to have the low
cost benefit of junction isolation without sacrificing the gain and noise performance of the low noise amplifier (LNA) operated at
5.2 GHz.
# 2003 Elsevier B.V. All rights reserved.
Keywords
SiGe , low noise amplifier , Deep trench isolation , Junction isolation , Mextram 504
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
999231
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