• Title of article

    The comparison of isolation technologies and device models on SiGe bipolar low noise amplifier

  • Author/Authors

    W.-C. Hua، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2004
  • Pages
    4
  • From page
    425
  • To page
    428
  • Abstract
    Junction isolation is promising for cost reduction and high power circuit applications due to its relatively lower fabrication complexity and thermal conductivity, but larger area and collector-substrate capacitance (Ccs) seem drawbacks as compared to the deep trench isolation (DTI) technology. A simulation work is proposed for the size selection guide of unit cell to have the low cost benefit of junction isolation without sacrificing the gain and noise performance of the low noise amplifier (LNA) operated at 5.2 GHz. # 2003 Elsevier B.V. All rights reserved.
  • Keywords
    SiGe , low noise amplifier , Deep trench isolation , Junction isolation , Mextram 504
  • Journal title
    Applied Surface Science
  • Serial Year
    2004
  • Journal title
    Applied Surface Science
  • Record number

    999231