Title of article :
Influence of target to substrate spacing on the
properties of ITO thin films
Author/Authors :
Aldrin Antony، نويسنده , , M. Nisha، نويسنده , , R. Manoj، نويسنده , , M.K. Jayaraj، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
Indium tin oxide thin films were deposited at room temperature on glass substrates by RF magnetron sputtering. The
structural, electrical and optical properties of the films showed a dependence on target to substrate spacing and annealing
temperature. Films deposited with a target to substrate spacing of 4 cm showed the lowest resistivity of 3:07 10 3 O cm and
maximum band gap of 3.89 eV on annealing at a temperature of 250 8C under high vacuum for 1 h.
# 2003 Elsevier B.V. All rights reserved
Keywords :
indium tin oxide , RF magnetron sputtering , annealing
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
