Abstract :
The influence of substrate temperature on the texture of the Al-doped zinc oxide (ZnO:Al or AZO) films prepared by reactive
mid-frequency (MF) magnetron sputtering has been studied by means of X-ray texture measurements. All the AZO films are
polycrystalline with wurtzite crystal structure. The main texture features found in the films consist of (0 0 2) and (1 0 1) fibre
components. The volume fraction of the (0 0 2) component increases and its spread (halfwidth) decreases with increase of the
substrate temperature, indicating an improved crystallinity of the films. The narrowest spread of 8.68 with a high volume fraction
of 62% is obtained for the film deposited at 150 8C. The films with degrading textures are observed at high substrate
temperatures above 200 8C. It is shown that the electrical properties of the films related to their structural properties. An
improvement of the mobility is noted for the film with a high degree of texture. The lowest resistivity of 4:6 10 4 O cm with a
mobility of 24 cm2/V s is obtained for the highly textured film deposited at 150 8C.
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