Title of article :
Electronic stopping powers for fluorine ions in 19Fþ-implanted potassium titanyl arsenate
Author/Authors :
Xiangdong Liu، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
7
From page :
77
To page :
83
Abstract :
Electronic stopping powers for 80–350 keV 19F ions in KTiOAsO4 (KTA) were obtained by range measurement. Depth profiles of 19F in KTA were measured by using the 19F(p, ag)16O resonant nuclear reaction at ER ¼ 872:1 keV, with width G ¼ 4:2 keV. A proper convolution calculation method was used to extract the true distributions of fluorine from the experimental excitation yield curves. The electronic stopping powers were derived through fitting the projected range distributions, simulated by using the TRIM/XLL code, to the experimentally measured range distributions. The electronic stopping cross sections were compared with those obtained from Monte Carlo simulation codes. # 2003 Elsevier B.V. All rights reserved
Keywords :
Resonant nuclear reaction , Electronic stopping power , KTiOAsO4
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999404
Link To Document :
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