Title of article
Electronic stopping powers for fluorine ions in 19Fþ-implanted potassium titanyl arsenate
Author/Authors
Xiangdong Liu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
7
From page
77
To page
83
Abstract
Electronic stopping powers for 80–350 keV 19F ions in KTiOAsO4 (KTA) were obtained by range measurement. Depth
profiles of 19F in KTA were measured by using the 19F(p, ag)16O resonant nuclear reaction at ER ¼ 872:1 keV, with width
G ¼ 4:2 keV. A proper convolution calculation method was used to extract the true distributions of fluorine from the
experimental excitation yield curves. The electronic stopping powers were derived through fitting the projected range
distributions, simulated by using the TRIM/XLL code, to the experimentally measured range distributions. The electronic
stopping cross sections were compared with those obtained from Monte Carlo simulation codes.
# 2003 Elsevier B.V. All rights reserved
Keywords
Resonant nuclear reaction , Electronic stopping power , KTiOAsO4
Journal title
Applied Surface Science
Serial Year
2004
Journal title
Applied Surface Science
Record number
999404
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