Title of article :
Advanced study of various characteristics found in RHEED patterns during the growth of InAs quantum dots on GaAs (0 0 1) substrate by molecular beam epitaxy
Author/Authors :
J.W. Lee*، نويسنده , , D. Schuh، نويسنده , , M. Bichler، نويسنده , , G. Abstreiter، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
7
From page :
306
To page :
312
Abstract :
Various characteristics of RHEED patterns were examined with respect to geometrical and crystallographic point of views including chevron patterns frequently found after the growth of self-assembled InAs quantum dots, streak lines and Laue circles from GaAs wafer surface. These three patterns offer clear understanding of surface morphology change during or after dot growth. Various patterns and geometrical relationship between those patterns, coupled with specific surface reconstruction structures of GaAs (0 0 1) surface were studied. # 2004 Elsevier B.V. All rights reserved.
Keywords :
Reflection high energy electron diffraction , Molecular beam epitaxy , Nanomaterials
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999435
Link To Document :
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