Title of article :
Plasma irradiation effects in phthalocyanine films
Author/Authors :
G.L. Pakhomov*، نويسنده , , M.N. Drozdov، نويسنده , , N.V. Vostokov، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
Plasma irradiation effects in copper phthalocyanine films were examined. The film surface and chemical composition were
characterized by means of atomic force microscopy (AFM) and secondary ion mass spectrometry (SIMS), including SIMS
profiling.
# 2004 Elsevier B.V. All rights reserved.
Keywords :
Phthalocyanines , Dry etching , SIMS , AFM , Heterostructures
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
