Author/Authors :
T.، Inoue, نويسنده , , T.، Nakayama, نويسنده , , Y.، Ando, نويسنده , , M.، Kuzuhara, نويسنده , , Y.، Okamoto, نويسنده , , H.، Miyamoto, نويسنده ,
Abstract :
AlGaN-GaN heterojunction field-effect transistors (HFETs) with a field modulating plate (FP) were fabricated on an SiC substrate. The gate-drain breakdown voltage (BV/sub gd/) was significantly improved by employing an FP electrode, and the highest BV/sub gd/ of 160 V was obtained with an FP length (L/sub FP/) of 1 (mu)m. The maximum drain current achieved was 750 mA/mm, together with negligibly small current collapse. A 1-mm-wide FPFET (L/sub FP/=1 (mu)m) biased at a drain voltage of 65 V demonstrated a continuous wave saturated output power of 10.3 W with a linear gain of 18.0 dB and a power-added efficiency of 47.3% at 2 GHz. To our knowledge, the power density of 10.3 W/mm is the highest ever achieved for any FET of the same gate size.