Title of article :
Aldehydes react with scribed silicon to form alkyl monolayers Characterization by ToF-SIMS suggests an even–odd effect
Author/Authors :
Yit-Yian Lua، نويسنده , , W. Jonathan J. Fillmore، نويسنده , , Matthew R. Linford*، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Pages :
5
From page :
323
To page :
327
Abstract :
Alkyl monolayers are formed when silicon is chemomechanically scribed in the presence of aldehydes (from butanal to nonanal). X-ray photoelectron spectroscopy (XPS), wetting, and time-of-flight secondary ion mass spectrometry (ToF-SIMS) suggest increasingly thick and hydrophobic monolayers with increasing aldehyde chain length. Superimposed on the general trend of stronger ToF-SIMS signals for hydrocarbon fragments from longer aldehyde precursors is an even–odd effect. This effect is most pronounced for smaller (one- and two-carbon) hydrocarbon fragments and for monolayers prepared with shorter aldehyde precursors. This is the first time than an even–odd effect has been demonstrated for monolayers on scribed silicon. # 2004 Elsevier B.V. All rights reserved.
Keywords :
Even–odd , Silicon , ALDEHYDE , Monolayer , Chemomechanical , ToF-SIMS
Journal title :
Applied Surface Science
Serial Year :
2004
Journal title :
Applied Surface Science
Record number :
999613
Link To Document :
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