Title of article :
Aldehydes react with scribed silicon to form alkyl monolayers
Characterization by ToF-SIMS suggests an even–odd effect
Author/Authors :
Yit-Yian Lua، نويسنده , , W. Jonathan J. Fillmore، نويسنده , , Matthew R. Linford*، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2004
Abstract :
Alkyl monolayers are formed when silicon is chemomechanically scribed in the presence of aldehydes (from butanal to
nonanal). X-ray photoelectron spectroscopy (XPS), wetting, and time-of-flight secondary ion mass spectrometry (ToF-SIMS)
suggest increasingly thick and hydrophobic monolayers with increasing aldehyde chain length. Superimposed on the general
trend of stronger ToF-SIMS signals for hydrocarbon fragments from longer aldehyde precursors is an even–odd effect. This
effect is most pronounced for smaller (one- and two-carbon) hydrocarbon fragments and for monolayers prepared with shorter
aldehyde precursors. This is the first time than an even–odd effect has been demonstrated for monolayers on scribed silicon.
# 2004 Elsevier B.V. All rights reserved.
Keywords :
Even–odd , Silicon , ALDEHYDE , Monolayer , Chemomechanical , ToF-SIMS
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science