Title of article
Changes in chemical behavior of thin film lead zirconate titanate during Ar+-ion bombardment using XPS
Author/Authors
Jae-Nam Kim، نويسنده , , Kwang-Soo Shin، نويسنده , , Dae-Hwan Kim، نويسنده , , Byung-Ok Park، نويسنده , , Nam-Kyoung Kim، نويسنده , , Sang-Hee Cho، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
10
From page
119
To page
128
Abstract
Thin film lead zirconate titanate (PZT) was grown on Pt/TiO2/SiO2/Si substrates using direct liquid injection metal organic chemical vapor deposition (DLI–MOCVD). The chemical states and stoichiometry was characterized by employing X-ray photoelectron spectroscopy (XPS). The discussion was focused on the chemical change during in-depth profile by Ar+-ion bombardment. In addition, relative atomic sensitivity factors (ASFs) were corrected to determine practically more accurate chemical compositions in the thin film PZT. And then, the chemical compositions by their application to quantification were compared with other data using the data base of Wagner ASFs and Scofield ASFs.
Keywords
Lead zirconate titanate (PZT) , Ar+-ion bombardment , X-ray photoelectron spectroscopy (XPS) , Relative atomic sensitivity factors (ASF)
Journal title
Applied Surface Science
Serial Year
2003
Journal title
Applied Surface Science
Record number
999714
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