Microstructural features of pulsed-laser deposited V2O5 thin films

Vanadium pentoxide (V2O5) thin films were grown onto amorphous glass substrates by pulsed-laser deposition (PLD). The surface morphology and structural features were studied by XRD, XPS, AFM, and FTIR to ensure the growth of V2O5 films. These investigations revealed that stoichiometric V2O5 films can be grown with a layered structure onto amorphous glass substrates at temperature as low as 200 °C and oxygen partial pressure of 100 mTorr.