Title of article
Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine
Author/Authors
Christopher S. Blackman، نويسنده , , Claire J. Carmalt، نويسنده , , Shane A. O’Neill، نويسنده , , Ivan P. Parkin، نويسنده , , Leonardo Apostolico، نويسنده , , Kieran C. Molloy، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
4
From page
2
To page
5
Abstract
Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl4 and tristrimethylsilylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented.
Keywords
Tristrimethylsilylphosphine , CVD , Titanium phosphide , Thin film
Journal title
Applied Surface Science
Serial Year
2003
Journal title
Applied Surface Science
Record number
999934
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