مرکز منطقه ای اطلاع رساني علوم و فناوري - Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Title of article :

Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Author/Authors :

Christopher S. Blackman، نويسنده , , Claire J. Carmalt، نويسنده , , Shane A. O’Neill، نويسنده , , Ivan P. Parkin، نويسنده , , Leonardo Apostolico، نويسنده , , Kieran C. Molloy، نويسنده ,

Issue Information :

روزنامه با شماره پیاپی سال 2003

Pages :

From page :

To page :

Abstract :

Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl4 and tristrimethylsilylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented.

Keywords :

Tristrimethylsilylphosphine , CVD , Titanium phosphide , Thin film

Journal title :

Applied Surface Science

Serial Year :

2003

Journal title :

Applied Surface Science

Record number :

999934

Link To Document :

https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=999934