Title :
Interface reactions during processing of chemical vapor deposited yttrium oxide high-k dielectrics
Author :
Gregory N. Parsons استاد راهنما , Gerald Lucovsky استاد مشاور , Veena Misra استاد مشاور , H. Henry Lamb استاد مشاور
University :
Raleigh North carolina state university
Major :
PhD )Chemical Engineering(
Keyword :
Interface reaction mechanisms , High-k gate dielectrics , CVD , Yttrium Oxide
