Title :
FORMATION OF LOW-RESISTIVITY GERMANOSILICIDE CONTACTS TO PHOSPHORUS DOPED SILICON-GERMANIUM ALLOY SOURCE/DRAIN JUNCTIONS FOR NANOSCALE CMOS
Author :
Veena Misra استاد مشاور , Douglas Barlage استاد مشاور , Gregory Parsons استاد مشاور , Mehmet Ozturk استاد راهنما
University :
Raleigh North carolina state university
Major :
PhD )Electrical Engineering(
Keyword :
SiGe , germanosilicide , contact reistance , silicide , MOSFET , silicon germanium , source drain
