DocumentCode :
11027
Title :
Charge Trapping Characterization Methodology for the Evaluation of Hafnium-based Gate Dielectric Film Systems
Author :
Veena Misra استاد مشاور , Dennis M. Maher استاد مشاور , Richard T. Kuehn استاد راهنما , George A. Brown استاد مشاور
University :
Virginia Polytechnic Institute and state University
Grade :
نامعلوم
Major :
PhD )Electrical Engineering(
Number of pages :
0
Publish Date :
2003
Keyword :
High-k , Gate dielectric , hafnium , charge trapping , Reliability , fast transient , charge pumping
Note :
01
Language :
انگليسي
Link To Document :
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