1277

Chemical Vapor Deposition of Thin Films for ULSI Interconnect Metallization

Andrew W. Maverick استاد مشاور , Kerry M. Dooley استاد مشاور , Douglas P. Harrison استاد مشاور , Gregory L.Griffin استاد راهنما

Lovisiana State University

دكتري

Doctor of Philosophy )Ph.D.( )Chemical Engineering(

0

2005

interconnect metallization , Cu)hfac(2 , Copper , Reaction Mechanism , chemical vapor deposition , TaF5 , barrier layer , electroless deposition , SiH4 , seed layer , Pd)hfac(2 , tantalum , PALLADIUM

01

انگليسي