Title :
SOME CHEMICAL AND ELECTROCHEMICAL ASPECTS OF THE CHEMICAL MECHANICAL POLISHING OF COPPER
Author :
Barbara A. Shaw استاد مشاور , Howard W. Pickering استاد مشاور , Tarasankar DebRoy استاد مشاور , Kwadwo Osseo-Asare استاد راهنما
University :
The Pennsylvania State University
Major :
PhD )Materials Science and Engineering(
Keyword :
CMP , chemical mechanical polishing , benzotriazoe , BTA , hydroxylamine , Copper , bare metal , Hydrogen peroxide
