DocumentCode :
1572
Title :
Low Dielectric Constant Fluorocarbon Films Containing Silicon by Plasma Enhanced Chemical Vapor Deposition
Author :
Aravamudhan Raman استاد مشاور , Pratul K. Ajmera استاد راهنما , Gil S. Lee استاد مشاور
University :
Lovisiana State University
Grade :
دكتري
Major :
Doctor of Philosophy )Ph.D.( )Electrical Computer Engineering(
Number of pages :
0
Publish Date :
2005
Keyword :
SiCF , low-k , Surface modification , ultralow-k , Dielectrics , fluorocarbon , silicon containing , PECVD
Note :
01
Language :
انگليسي
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=17&DC=1572
