DocumentCode :
17780
Title :
Study of Thin Silicon Oxides and High-K Materials for Gate Dielectrics in Metal-Insulator-Si Structures
Author :
Osama O. Awadelkarim استاد راهنما , Mark W. Horn استاد مشاور , S. Ashok استاد مشاور
University :
Pennsylvania State University
Grade :
نامعلوم
Major :
PhD )Dissertation(
Number of pages :
0
Publish Date :
2004
Keyword :
thin oxide , high k , Gate dielectrics , characterization
Note :
01
Language :
انگليسي
Link To Document :
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