Title :
Si-SiO2 interface behavior in n-MOSFETs with screening potential during high-field injection
Author :
Misra Durgamadhab استاد راهنما , Tsybeskov Leonid استاد مشاور
University :
Van Houten Library )new Jersey Institute Of Technology(
Major :
Master of Science )Department of Electrical and Computer Engineering(
Keyword :
n-channel MOSFETs , Hot carrier stress degradation , Plasma processing
