DocumentCode :
27343
Title :
Modeling of the plasma etching of polysilicon with chloro- and bromo-trifluoromethane discharges
Author :
Herbert H. Swain. استاد راهنما
University :
Dspace at Mit Libraries
Grade :
نامعلوم
Major :
Thesis )Ph. D.(
Number of pages :
0
Publish Date :
1986
Note :
01
Language :
انگليسي
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=17&DC=27343
