DocumentCode :
4092
Title :
Development of Inorganic Resists for Electron Beam Lithography: Novel Materials and Simulations
Author :
Clifford L. Henderson استاد راهنما , Brent Carter استاد مشاور , Dennis Hess استاد مشاور
University :
Georgia Institute Of Technology
Grade :
دكتري
Major :
Doctor of Philosophy
Number of pages :
0
Publish Date :
2004
Keyword :
Lithography , Monte Carlo simulation , Metal-organic , electron beam , inorganic , Resist
Note :
01
Language :
انگليسي
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=17&DC=4092
