DocumentCode :
7265
Title :
Gan -dielectric interface formation for gate dielectrics and passivation layers using remote plasma processing
Author :
Gerald Lucovsky استاد راهنما
University :
Raleigh North carolina state university
Grade :
نامعلوم
Major :
PhD )Electrical Engineering(
Number of pages :
0
Publish Date :
2003
Keyword :
interface passivation SiO2 MOS gate dielectric Gan
Note :
01
Language :
انگليسي
Link To Document :
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