DocumentCode
9115
Title
Breakdown and Reliability of CMOS Devices with Stacked Oxide/Nitride and Oxynitride Gate Dielectrics Prepared by RPECVD
Author
Gerald Lucovsky استاد مشاور , Veena Misra استاد مشاور , John Hauser استاد مشاور , Carlton Osburn استاد راهنما
University
Raleigh North carolina state university
Grade
نامعلوم
Major
PhD )Electrical Engineering(
Number of pages
0
Publish Date
2003
Keyword
Gate dielectrics , TDDB breakdown , Reliability
Note
01
Language
انگليسي
Link To Document