شماره ركورد كنفرانس :
3975
عنوان مقاله :
Investigation of silanized- povidone/SiO2 nanocomposite by deconvolution of the Si2s, C1s and O1s XPS spectra
عنوان به زبان ديگر :
Investigation of silanized- povidone/SiO2 nanocomposite by deconvolution of the Si2s, C1s and O1s XPS spectra
پديدآورندگان :
Hashemi, Adeleh Department of Solid State Physics, University of Mazandaran , Bahari Ali a.bahari@umz.ac.ir Department of Solid State Physics, University of Mazandaran,
تعداد صفحه :
5
كليدواژه :
Nanocomposite , Silane coupling agent , Surface roughness.
سال انتشار :
1396
عنوان كنفرانس :
اولين همايش ملي توسعه فناوري نانو
زبان مدرك :
انگليسي
چكيده فارسي :
In the present study, povidone-SiO2 nanocomposite was synthesized by a silane coupling agent as a cross-linking agent and then deposited on the p-type Si substrate. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were applied to investigation of the nanocomposite structure. Deconvoluted Si2s, C1s and O1s core levels proved that the strong chemical interactions were created between organic and inorganic phases. The resulted nanocomposite film formed a very fine grain size and very low surface roughness of 0.036 nm which is one of the key factors for gate dielectric film in field-effect-transistors.
چكيده لاتين :
In the present study, povidone-SiO2 nanocomposite was synthesized by a silane coupling agent as a cross-linking agent and then deposited on the p-type Si substrate. X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were applied to investigation of the nanocomposite structure. Deconvoluted Si2s, C1s and O1s core levels proved that the strong chemical interactions were created between organic and inorganic phases. The resulted nanocomposite film formed a very fine grain size and very low surface roughness of 0.036 nm which is one of the key factors for gate dielectric film in field-effect-transistors.
كشور :
ايران
لينک به اين مدرک :
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