NICKEL FILMS

In this work geometry characterizations of amorphous carbon nickel films grown by radio frequency (RF) magnetron co-sputtering on glass substrates were studied. The amorphous carbon nickel films were deposited under different deposition processing, 1.78, 3.21, 3.92 and 4.64% nickel surface area at room temperature. Atomic force microscopy (AFM) was employed to characterize images and fractal analyses of films. Fractal dimensions of films were obtained by the power spectral densities P(k) plots. The films deposited at 3.92 % nickel surface area have maximum variations in P(k) plots and minimum values of fractal dimensions. It is observed that films deposited at 3.92 % nickel surface area have minimum of root mean square (RMS) roughness about 0.53 nm.