Study of masks used in glass etch industry

Surface etching technique is commonly used for industrial decoration of glasses. Hydrofluoric acid (HF) solutions or pastes, pure or mixed with other chemicals, are employed as strong corrosive agents to engrave chemically the glass surface. In the wet etching method protective layers as masks are required extensively to prevent the extent of HF to undesired regions. Here, in this study, we are mostly concerned with mask chemical employed in glass etching technique on different surfaces. Thus, analytical tests on the provided industrial masks have been studied. FTIR for detecting base resin, XRD for analyzing major pigments, PSA for determining particle size and distribution techniques have been studied. Results have indicated two different resins; unsaturated polyester and acrylic polymer (PMMA) diluted with monomer styrene. Talc and sulfur are analyzed as major fillers or pigments with 10 µm particle size. Finally, different mask formulations have been compounded and tested primarily for HF resistant penetration..