Author/Authors
R. Gunawan، نويسنده , , M.Y.L. Jung، نويسنده , , E.G. Seebauer and R.D. Braatz، نويسنده ,
DocumentNumber
1384590
Title Of Article
Optimal control of rapid thermal annealing in a semiconductor process
شماره ركورد
11491
Latin Abstract
This study focuses on the optimal control of rapid thermal annealing (RTA) used in the formation of ultrashallow junctions
needed in next-generation microelectronic devices. Comparison of different parameterizations of the optimal trajectories shows that
linear profiles give the best combination of minimizing junction depth and sheet resistance. Worst-case robustness analysis of the
optimal control trajectory motivates improvements in feedback control implementations for these processes. This is the first time
that the effects of model uncertainties and control implementation inaccuracies are rigorously quantified for RTA.
From Page
423
NaturalLanguageKeyword
optimal control , uncertainty analysis , Robustness analysis , Microelectronics processes , Semiconductor processing , Rapidthermal annealing , Batch control
JournalTitle
Studia Iranica
To Page
430
To Page
430
Link To Document