SÖNMEZOĞLU, Savaş Karamanoğlu Mehmetbey Üniversitesi - Kamil Özdağ Fen Fakültesi - Fizik Bölümü, Turkey , KOÇ, Mehmed Selçuk Üniversitesi - Fen Bilimleri Enstitüsü - Fizik Bölümü, Turkey , AKIN, Seçkin Karamanoğlu Mehmetbey Üniversitesi - Kamil Özdağ Fen Fakültesi - Fizik Bölümü, Turkey

Thin film production techniques

28182

Thin films forming the basis of electronic device technology have gained a great acceleration between the research and development studies in recent years. The resulting performance obtained from the thin films having a wide range of using area, is very important parameter, and this is also directly related to the production techniques. Differences in production techniques and production conditions in thin films, reveals many properties not being in bulk materials. These properties give superior properties to thin-film materials than bulk materials, and lead the way for new studies by the development of technology. New production technologies have emerged and developed as an alternative to each other in production of thin films. In this study solid, liquid and gas phases in three different with sub-types of these techniques are described in detail and also investigations of their advantages and disadvantages are intended. Furthermore, the parameters such as Ph value of the solution, temperature and reaction time, solvent concentration, structure and concentration of the used catalyzer, annealing temperature and annealing time, drying and drying atmosphere, substrate are investigated the effect on film quality, film thickness and production cost.

389

Thin Films , Thin Film Production Techniques , Vapor Phase Deposition , Liquid Phase Deposition , Solid Phase Deposition

Erciyes University Journal Of The Institute Of Science an‎d Technology

401