• DocumentCode
    1000081
  • Title

    Anisotrophy control of Ni-Fe films through sequenced-field deposition

  • Author

    Beam, W.R. ; Siegle, W.T.

  • Author_Institution
    IBM Research Center, Yorktown Heights, N.Y.
  • Volume
    1
  • Issue
    1
  • fYear
    1965
  • fDate
    3/1/1965 12:00:00 AM
  • Firstpage
    66
  • Lastpage
    67
  • Abstract
    Anisotropy of nickel-iron films of 82, 74, and 66 per cent nickel compositions was controlled by time-sequenced application of orthogonal fields during deposition. Resulting anisotropy values are in agreement with simple M -induced anisotropy principles. Coercive forces show small but definite decrease with anisotropy constant. Dispersion angle is proportional to the reciprocal of the anisotropy constant. The technique is suitable for production of low-Hkfilms. It permits nonanomalous inverted films to be produced and allows the study of other anisotropy sources.
  • Keywords
    Iron-nickel films; Magnetic anisotropy; Nickel-iron films; Anisotropic magnetoresistance; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Magnetostatics; Nickel; Perpendicular magnetic anisotropy; Relays; Substrates; Torque measurement;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1965.1062914
  • Filename
    1062914