DocumentCode
1000081
Title
Anisotrophy control of Ni-Fe films through sequenced-field deposition
Author
Beam, W.R. ; Siegle, W.T.
Author_Institution
IBM Research Center, Yorktown Heights, N.Y.
Volume
1
Issue
1
fYear
1965
fDate
3/1/1965 12:00:00 AM
Firstpage
66
Lastpage
67
Abstract
Anisotropy of nickel-iron films of 82, 74, and 66 per cent nickel compositions was controlled by time-sequenced application of orthogonal fields during deposition. Resulting anisotropy values are in agreement with simple
-induced anisotropy principles. Coercive forces show small but definite decrease with anisotropy constant. Dispersion angle is proportional to the reciprocal of the anisotropy constant. The technique is suitable for production of low-Hk films. It permits nonanomalous inverted films to be produced and allows the study of other anisotropy sources.
-induced anisotropy principles. Coercive forces show small but definite decrease with anisotropy constant. Dispersion angle is proportional to the reciprocal of the anisotropy constant. The technique is suitable for production of low-HKeywords
Iron-nickel films; Magnetic anisotropy; Nickel-iron films; Anisotropic magnetoresistance; Magnetic anisotropy; Magnetic field measurement; Magnetic films; Magnetostatics; Nickel; Perpendicular magnetic anisotropy; Relays; Substrates; Torque measurement;
fLanguage
English
Journal_Title
Magnetics, IEEE Transactions on
Publisher
ieee
ISSN
0018-9464
Type
jour
DOI
10.1109/TMAG.1965.1062914
Filename
1062914
Link To Document