DocumentCode :
1000512
Title :
Transient behavior of the kink effect in partially-depleted SOI MOSFET´s
Author :
Wei, A. ; Sherony, M.J. ; Antoniadis, D.A.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
Volume :
16
Issue :
11
fYear :
1995
Firstpage :
494
Lastpage :
496
Abstract :
The behavior of transients in the drain current of partially-depleted (PD) SOI MOSFET´s down to L/sub eff/=0.2 μm is examined as a function of drain bias, gate pulses of varying magnitude (V/sub GS/), pulse duration, and pulse frequency. At fixed V/sub DS/, the gate is pulsed to values ranging from 0.1 V above VT to V/sub GS/=V/sub DS/. A slow transient is seen when the drain is biased at a V/sub DS/ where the current kink is observable. This slow transient can be on the order of microseconds depending on the relative magnitude of the impact ionization rate. For short times after the pulse edge or for very short pulses at low frequencies, it is shown that the subthreshold drain current value can be very different from the corresponding DC, and that the kink characteristic of PD MOSFET´s disappears. However, the kink values can be approached when the pulse frequency and/or duration applied to the gate is increased, due to the latent charge maintained in the floating body at higher frequencies. No transient current effects were observed in fully-depleted SOI MOSFET´s.
Keywords :
MOSFET; electric current; impact ionisation; silicon-on-insulator; transient analysis; 0.2 micron; Si; drain bias; drain current; floating body; gate pulse magnitude; impact ionization rate; kink effect; latent charge; partially-depleted SOI MOSFET; pulse duration; pulse frequency; transient behavior; Coaxial components; Frequency; MOSFET circuits; Oscilloscopes; Power measurement; Pulse generation; Pulse measurements; Pulsed power supplies; Resistors; Transient response;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.468278
Filename :
468278
Link To Document :
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