DocumentCode
1000694
Title
Test Considerations for Gate Oxide Shorts in CMOS ICs
Author
Soden, Jerry M. ; Hawkins, Charles F.
Author_Institution
Sandia National Laboratories
Volume
3
Issue
4
fYear
1986
Firstpage
56
Lastpage
64
Abstract
Gate oxide shorts are defects that must be detected to produce high-reliability ICs. These problems will continue as devices are scaled down and oxide thicknesses are reduced to the 100-Ã
range. Complete detection of gate oxide shorts and other CMOS failure mechanisms requires measuring the IDD current during the quiescent state after each test vector is applied to the IC. A 100-percent stuck-at fault test set is effective only if each test vector is accompanied by an IDD measurement. This article examines the need for a fast, sensitive method of measuring IDD during each test vector and discusses problems confronting CMOS IC designers, test engineers and test instrumentation designers as they work to meet these demands.
Keywords
CMOS integrated circuits; CMOS logic circuits; Circuit faults; Circuit testing; Electrical fault detection; Electrostatic discharge; Laboratories; Logic testing; MOSFETs; Semiconductor device modeling;
fLanguage
English
Journal_Title
Design & Test of Computers, IEEE
Publisher
ieee
ISSN
0740-7475
Type
jour
DOI
10.1109/MDT.1986.294977
Filename
4069835
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