Title :
Test Considerations for Gate Oxide Shorts in CMOS ICs
Author :
Soden, Jerry M. ; Hawkins, Charles F.
Author_Institution :
Sandia National Laboratories
Abstract :
Gate oxide shorts are defects that must be detected to produce high-reliability ICs. These problems will continue as devices are scaled down and oxide thicknesses are reduced to the 100-Ã
range. Complete detection of gate oxide shorts and other CMOS failure mechanisms requires measuring the IDD current during the quiescent state after each test vector is applied to the IC. A 100-percent stuck-at fault test set is effective only if each test vector is accompanied by an IDD measurement. This article examines the need for a fast, sensitive method of measuring IDD during each test vector and discusses problems confronting CMOS IC designers, test engineers and test instrumentation designers as they work to meet these demands.
Keywords :
CMOS integrated circuits; CMOS logic circuits; Circuit faults; Circuit testing; Electrical fault detection; Electrostatic discharge; Laboratories; Logic testing; MOSFETs; Semiconductor device modeling;
Journal_Title :
Design & Test of Computers, IEEE
DOI :
10.1109/MDT.1986.294977