Propagation characteristics of shear horizontal surface acoustic waves in (11 2 0) ZnO film/silica glass substrate structures

Author

Tanaka, Atsushi ; Yanagitani, Takahiko ; Matsukawa, Mami ; Watanabe, Yoshiaki

Author_Institution

Fac. of Eng., Doshisha Univ., Kyoto

Volume

55

Issue

12

fYear

2008

fDate

12/1/2008 12:00:00 AM

Firstpage

2709

Lastpage

2713

Abstract

This paper presents the propagation characteristics of the shear horizontal surface acoustic wave (SH-SAW) in ZnO (0deg, 90deg, psi) (11 2macr 0) textured ZnO films. ZnO (0deg, 90deg, 0deg) film/interdigital transducer (IDT) electrode/silica glass substrate structures were fabricated by RF magnetron sputtering. Experimental results demonstrate that SH-SAW was clearly excited in these structures. We also theoretically estimated the electromechanical coupling coefficient K² in the ZnO (0deg, 90deg, psi) film/silica glass substrate structure. The theoretical results show that the IDT electrode/ZnO (0deg, 90deg, 55deg) film/silica glass substrate structure had a relatively high K² value of 3.4%. Moreover, the shear horizontal displacement component of the SH-SAW in this structure is much larger than the transverse and longitudinal displacement components. This structure could be used in SH-SAW sensors for evaluating the electrical properties of liquids.

Keywords

II-VI semiconductors; electrodes; interdigital transducers; piezoelectric thin films; piezoelectricity; semiconductor thin films; sputter deposition; surface acoustic wave sensors; surface acoustic wave transducers; surface acoustic waves; texture; wide band gap semiconductors; zinc compounds; RF magnetron sputtering; SH-SAW sensors; ZnO-SiO₂; electrical properties; electromechanical coupling coefficient; film-interdigital transducer electrode-silica glass substrate structures; longitudinal displacement components; piezoelectric films; propagation characteristics; semiconductor film-silica glass substrate structures; shear horizontal displacement component; shear horizontal surface acoustic waves; textured films; transverse displacement components; Acoustic propagation; Acoustic transducers; Acoustic waves; Electrodes; Glass; Silicon compounds; Substrates; Surface acoustic waves; Surface texture; Zinc oxide; Acoustics; Electrochemistry; Electromagnetic Phenomena; Glass; Models, Theoretical; Silicon Dioxide; Transducers; X-Ray Diffraction; Zinc Oxide;

fLanguage

English

Journal_Title

Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on

Publisher

ieee

ISSN

0885-3010

Type

jour

DOI

10.1109/TUFFC.2008.986

Filename

4683478