• DocumentCode
    1001311
  • Title

    Total dose characterization of a CMOS technology at high dose rates and temperatures

  • Author

    Browning, J.S. ; Connors, M.P. ; Freshman, C.L. ; Finney, G.A.

  • Author_Institution
    Sandia Nat. Labs., Albuquerque, NM, USA
  • Volume
    35
  • Issue
    6
  • fYear
    1988
  • fDate
    12/1/1988 12:00:00 AM
  • Firstpage
    1557
  • Lastpage
    1562
  • Abstract
    Radiation-hardened MOS ICs and transistors were irradiated using several high-dose-rate sources. A strong dependence of the dose-to-failure level is observed for different circuit designs, the dose per pulse, package temperature, and the average dose rate of the radiation source at ambient and elevated temperatures. The results indicate that extrapolating very high dose rate IC and transistor properties from Co-60 or X-ray source data could be extremely difficult and poses a serious problem for any hardness assurance program. For extrapolating to strategic applications, and intimate knowledge of the circuit design and performance and a knowledge of the transistor performance in the environment of interest are necessary
  • Keywords
    CMOS integrated circuits; X-ray effects; environmental testing; gamma-ray effects; integrated circuit technology; integrated circuit testing; quality control; radiation hardening (electronics); semiconductor technology; semiconductor-insulator boundaries; 60Co radiation source; CMOS technology; MOS ICs; Si-SiO2; X-ray source; ambient temperature; average dose rate; circuit designs; dose per pulse; dose-to-failure level; elevated temperatures; extrapolating very high dose rate; hardness assurance; high dose rates; high-dose-rate sources; package temperature; radiation hardness testing; total dose characterization; transistor performance; Annealing; CMOS integrated circuits; CMOS technology; Circuit synthesis; Ionizing radiation; Laboratories; Linear particle accelerator; Temperature; Threshold voltage; Voltage measurement;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.25497
  • Filename
    25497