DocumentCode :
1001324
Title :
Chlorine concentration profiles in silica fibres
Author :
Hanafusa, H. ; Tajima, Y.
Author_Institution :
NTT Ibaraki Electrical Communication Laboratory, Tokai, Japan
Volume :
20
Issue :
4
fYear :
1984
Firstpage :
178
Lastpage :
179
Abstract :
Chlorine concentration profiles in silica fibres were studied by X-ray microanalysis and consideration of the chemical reactions concerned with chlorine in the fibre fabrication process. The chlorine content was proportional to the doped element contents. The Cl/Ge content ratio was larger than the Cl/Si or Cl/P content ratio.
Keywords :
X-ray chemical analysis; chlorine; optical fibres; silicon compounds; Cl concentration profiles; Cl/Ge content ratio; Cl/P content ratio; Cl/Si content ratio; SiO2; X-ray microanalysis; doped element contents; fibre fabrication process; optical fibres; silica;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19840119
Filename :
4249731
Link To Document :
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