• DocumentCode
    1001663
  • Title

    Optimization of silicon bipolar transistors for high current gain at low temperatures

  • Author

    Woo, Jason C S ; Plummer, James D.

  • Author_Institution
    Integrated Circuits Lab., Stanford Univ., CA, USA
  • Volume
    35
  • Issue
    8
  • fYear
    1988
  • fDate
    8/1/1988 12:00:00 AM
  • Firstpage
    1311
  • Lastpage
    1321
  • Abstract
    Bipolar transistors designed specifically for operation at liquid-nitrogen (LN2) temperature are discussed. It is found that for high-gain LN2 bipolar transistors, the emitter concentration should be around 5×1018 cm-3. Compensating impurities in the base should be kept to minimum. Test bipolar transistors with polysilicon emitter contacts were fabricated using these criteria. The devices show very little current degradation between room temperature and 77 k. Polysilicon emitter contacts are also shown to be somewhat more effective at lower temperatures
  • Keywords
    bipolar transistors; elemental semiconductors; semiconductor device models; semiconductor technology; silicon; 77 to 300 K; Si bipolar transistors; current degradation; current gain; emitter concentration; high gain bipolar transistors; low temperatures; models; operation; polycrystalline Si emitters; room temperature; Bipolar transistors; CMOS technology; Degradation; Delay; Impurities; Integrated circuit interconnections; Photonic band gap; Silicon; Temperature; Very large scale integration;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.2553
  • Filename
    2553