DocumentCode
1001663
Title
Optimization of silicon bipolar transistors for high current gain at low temperatures
Author
Woo, Jason C S ; Plummer, James D.
Author_Institution
Integrated Circuits Lab., Stanford Univ., CA, USA
Volume
35
Issue
8
fYear
1988
fDate
8/1/1988 12:00:00 AM
Firstpage
1311
Lastpage
1321
Abstract
Bipolar transistors designed specifically for operation at liquid-nitrogen (LN2) temperature are discussed. It is found that for high-gain LN2 bipolar transistors, the emitter concentration should be around 5×1018 cm-3. Compensating impurities in the base should be kept to minimum. Test bipolar transistors with polysilicon emitter contacts were fabricated using these criteria. The devices show very little current degradation between room temperature and 77 k. Polysilicon emitter contacts are also shown to be somewhat more effective at lower temperatures
Keywords
bipolar transistors; elemental semiconductors; semiconductor device models; semiconductor technology; silicon; 77 to 300 K; Si bipolar transistors; current degradation; current gain; emitter concentration; high gain bipolar transistors; low temperatures; models; operation; polycrystalline Si emitters; room temperature; Bipolar transistors; CMOS technology; Degradation; Delay; Impurities; Integrated circuit interconnections; Photonic band gap; Silicon; Temperature; Very large scale integration;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.2553
Filename
2553
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