DocumentCode
1001811
Title
Physics-based compact model of nanoscale MOSFETs-Part II: effects of degeneracy on transport
Author
Mugnaini, Giorgio ; Iannaccone, Giuseppe
Author_Institution
Dipt. di Ingegneria dell´´Informazione, Univ. di Pisa, Italy
Volume
52
Issue
8
fYear
2005
Firstpage
1802
Lastpage
1806
Abstract
In this paper, we extend our derivation of an analytical model for nanoscale MOSFETs, focusing on the effects of Fermi-Dirac statistics on vertical electrostatics and on carrier transport. We derive a relation between mobility and mean-free path valid under degenerate statistics, and investigate the cases of rectangular and triangular quantum confinement under Fermi-Dirac statistics in the transition from DD to B transport. We derive a simple, physics-based and continuous analytical model that describes double-gate MOSFETs, fully depleted silicon-on-insulator MOSFETs, and bulk MOSFETs in the electric quantum limit in the whole range of transport regimes comprised between DD (device length much larger than mean-free path) and B (device length much smaller than mean-free path).
Keywords
MOSFET; ballistic transport; nanoelectronics; quantum statistical mechanics; semiconductor device models; Fermi-Dirac statistics; ballistic transport; bulk MOSFET; carrier transport; continuous analytical model; degenerate statistics; double-gate MOSFET; electric quantum limit; fully depleted SOI MOSFET; nanoscale MOSFET; physics-based compact model; quantum confinement; vertical electrostatics; Analytical models; Capacitance; Circuit simulation; Electrostatics; Equations; MOSFET circuits; Potential well; Silicon on insulator technology; Statistical analysis; Statistics; Ballistic (B) transport; MOSFETs; compact modeling; degeneracy; quantum confinement;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2005.851831
Filename
1468371
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