DocumentCode :
1001936
Title :
Modeling of substrate noise coupling for nMOS transistors in heavily doped substrates
Author :
Hsu, Shuching ; Fiez, Terri S. ; Mayaram, Kartikeya
Volume :
52
Issue :
8
fYear :
2005
Firstpage :
1880
Lastpage :
1886
Abstract :
An n-contact to p-contact model is proposed for analyzing substrate noise coupling in mixed-signal integrated circuits. The model takes advantage of an existing p-contact to p-contact model and combines it with a new concept of virtual separation. The virtual separation concept has been validated with three-dimensional device simulations and measurements from test structures fabricated in a 0.35 μm CMOS heavily doped process. This model is useful when transistor switching noise is the dominant source of substrate noise coupling.
Keywords :
CMOS integrated circuits; MOSFET circuits; circuit simulation; integrated circuit modelling; integrated circuit noise; mixed analogue-digital integrated circuits; substrates; 0.35 micron; CMOS process; device simulations; heavily doped substrates; integrated circuit noise; mixed-signal integrated circuits; n-contact model; nMOS transistors; p-contact model; substrate coupling; substrate noise coupling; substrate parasitic extraction; transistor switching noise; virtual separation; CMOS process; Circuit simulation; Circuit testing; Coupling circuits; Integrated circuit measurements; Integrated circuit modeling; Integrated circuit noise; MOSFETs; Mixed analog digital integrated circuits; Semiconductor device modeling; Integrated circuit noise; modeling of noise coupling; substrate coupling; substrate noise; substrate parasitic extraction;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2005.852171
Filename :
1468382
Link To Document :
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