DocumentCode :
1003076
Title :
Preparation of SmCo amorphous magnetic film with perpendicular magnetization
Author :
Lee, Z.Y. ; numata, T. ; Inokuchi, S. ; Sakurai, Y.
Author_Institution :
Huazhong University of Science and Technology, Hubei, China.
Volume :
20
Issue :
5
fYear :
1984
fDate :
9/1/1984 12:00:00 AM
Firstpage :
1335
Lastpage :
1337
Abstract :
Smx Co100-x ( 
) films deposited on glass substrate and Sm37.8 Co62.2 films deposited on silicon substrate with perpendicular magnetization have been prepared by a magnetron rf sputtering. The influence of sputtering conditions, i.e. bias voltage; substrate temperature; composition and perpendicular magnetic field on perpendicular anisotropy are reported in detail.
) films deposited on glass substrate and SmKeywords :
Amorphous magnetic films/devices; Magnetic anisotropy; Amorphous magnetic materials; Amorphous materials; Glass; Magnetic films; Magnetization; Semiconductor films; Silicon; Sputtering; Substrates; Voltage;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1984.1063196
Filename :
1063196
Link To Document :
