• DocumentCode
    1003076
  • Title

    Preparation of SmCo amorphous magnetic film with perpendicular magnetization

  • Author

    Lee, Z.Y. ; numata, T. ; Inokuchi, S. ; Sakurai, Y.

  • Author_Institution
    Huazhong University of Science and Technology, Hubei, China.
  • Volume
    20
  • Issue
    5
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    1335
  • Lastpage
    1337
  • Abstract
    SmxCo100-x( 20 \\leq x \\leq 30 ) films deposited on glass substrate and Sm37.8Co62.2films deposited on silicon substrate with perpendicular magnetization have been prepared by a magnetron rf sputtering. The influence of sputtering conditions, i.e. bias voltage; substrate temperature; composition and perpendicular magnetic field on perpendicular anisotropy are reported in detail.
  • Keywords
    Amorphous magnetic films/devices; Magnetic anisotropy; Amorphous magnetic materials; Amorphous materials; Glass; Magnetic films; Magnetization; Semiconductor films; Silicon; Sputtering; Substrates; Voltage;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1984.1063196
  • Filename
    1063196