DocumentCode
1003231
Title
Electron mobility in indium nitride
Author
Tansley, T.L. ; Foley, C.P.
Author_Institution
Macquarie University, School of Maths & Physics, North Ryde, Australia
Volume
20
Issue
25
fYear
1984
Firstpage
1066
Lastpage
1068
Abstract
Measurements of the transport properties of RF sputtered polycrystalline films of indium nitride are presented. The maximum electron mobility measured is 5000 cm2V¿1s¿1 at 150 K, and the lowest electron concentrations obtained are 5Ã1016 cm¿3 at 300 K falling to a constant value of 3Ã1016 in the range 30¿150 K. These results are significantly better than those hitherto reported. The temperature dependence of mobility is attributed to ionised impurity sscattering at low temperatures and space charge scattering at higher temperatures.
Keywords
III-V semiconductors; carrier mobility; electronic conduction in crystalline semiconductor thin films; impurity scattering; indium compounds; semiconductor thin films; sputtered coatings; 150K; 30 to 150K; 300K; III-V semiconductors; RF sputtered polycrystalline films; electron mobility; ionised impurity scattering; space charge scattering; temperature dependence; transport properties;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19840729
Filename
4250530
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