New Applications

Results of experimental work at the IBM Research Division, Yorktown Heights, New York, to fabricate sub-micron structures for electronic devices were reported in a recent issue of the Journal of Vacuum Science and Technology, published by the American Institute of Physics. The work involves the use of short wavelength radiation–ranging from far ultraviolet light in the range 2000 to 2600 angstroms through x-rays (typically 100 to less than 1 angstrom) to electron beams (much less than one angstrom)–to define circuit patterns for silicon integrated circuits and magnetic bubble devices.