DocumentCode :
1005038
Title :
Contact resistance of silicon-polysilicon interconnection for different current-flow geometries
Author :
Walton, A.J. ; Holwill, R. ; Robertson, J.M.
Author_Institution :
University of Edinburgh, Edinburgh Microfabrication Facility Department of Electrical Engineering, Edinburgh, UK
Volume :
21
Issue :
1
fYear :
1985
Firstpage :
13
Lastpage :
14
Abstract :
The relationship between contact window dimensions, specific contact resistivity ¿c and sheet resistance on contact resistance has been investigated for different current-flow geometries. It is shown that as the window size is reduced, ¿c starts to become the dominant factor giving contact resistances independent of the direction of current flow.
Keywords :
VLSI; contact resistance; ohmic contacts; contact resistances; contact resistivity; contact window dimensions; current-flow geometries; sheet resistance;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850009
Filename :
4250809
Link To Document :
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