• DocumentCode
    1005038
  • Title

    Contact resistance of silicon-polysilicon interconnection for different current-flow geometries

  • Author

    Walton, A.J. ; Holwill, R. ; Robertson, J.M.

  • Author_Institution
    University of Edinburgh, Edinburgh Microfabrication Facility Department of Electrical Engineering, Edinburgh, UK
  • Volume
    21
  • Issue
    1
  • fYear
    1985
  • Firstpage
    13
  • Lastpage
    14
  • Abstract
    The relationship between contact window dimensions, specific contact resistivity ¿c and sheet resistance on contact resistance has been investigated for different current-flow geometries. It is shown that as the window size is reduced, ¿c starts to become the dominant factor giving contact resistances independent of the direction of current flow.
  • Keywords
    VLSI; contact resistance; ohmic contacts; contact resistances; contact resistivity; contact window dimensions; current-flow geometries; sheet resistance;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19850009
  • Filename
    4250809