DocumentCode :
1005055
Title :
CoCr thin films prepared by high rate magnetron sputtering
Author :
Röll, K. ; Schuller, K.H. ; Münz, W.D.
Author_Institution :
Leybold-Heraeus Technologies Inc., San Jose, CA
Volume :
20
Issue :
5
fYear :
1984
fDate :
9/1/1984 12:00:00 AM
Firstpage :
771
Lastpage :
773
Abstract :
CoCr thin films for perpendicular recording have been prepared by magnetron sputtering from 6 mm to 8 mm thick targets with deposition rates up to 12 nm/s. From hysteresis loops and x-ray diffraction patterns it was concluded that the films have a perpendicular magnetic anisotropy and a hcp-texture with c-axis normal to the film plane. The coercivity Hc( \\perp ) ranged from 20 kA/m to 140 kA/m.
Keywords :
Magnetic recording/recording materials; Magnetrons; Sputtering; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic hysteresis; Magnetic shielding; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Saturation magnetization; Shape; Sputtering;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.1984.1063375
Filename :
1063375
Link To Document :
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