• DocumentCode
    1005055
  • Title

    CoCr thin films prepared by high rate magnetron sputtering

  • Author

    Röll, K. ; Schuller, K.H. ; Münz, W.D.

  • Author_Institution
    Leybold-Heraeus Technologies Inc., San Jose, CA
  • Volume
    20
  • Issue
    5
  • fYear
    1984
  • fDate
    9/1/1984 12:00:00 AM
  • Firstpage
    771
  • Lastpage
    773
  • Abstract
    CoCr thin films for perpendicular recording have been prepared by magnetron sputtering from 6 mm to 8 mm thick targets with deposition rates up to 12 nm/s. From hysteresis loops and x-ray diffraction patterns it was concluded that the films have a perpendicular magnetic anisotropy and a hcp-texture with c-axis normal to the film plane. The coercivity Hc( \\perp ) ranged from 20 kA/m to 140 kA/m.
  • Keywords
    Magnetic recording/recording materials; Magnetrons; Sputtering; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic hysteresis; Magnetic shielding; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Saturation magnetization; Shape; Sputtering;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.1984.1063375
  • Filename
    1063375