Title :
CoCr thin films prepared by high rate magnetron sputtering
Author :
Röll, K. ; Schuller, K.H. ; Münz, W.D.
Author_Institution :
Leybold-Heraeus Technologies Inc., San Jose, CA
fDate :
9/1/1984 12:00:00 AM
Abstract :
CoCr thin films for perpendicular recording have been prepared by magnetron sputtering from 6 mm to 8 mm thick targets with deposition rates up to 12 nm/s. From hysteresis loops and x-ray diffraction patterns it was concluded that the films have a perpendicular magnetic anisotropy and a hcp-texture with c-axis normal to the film plane. The coercivity H
c(

) ranged from 20 kA/m to 140 kA/m.
Keywords :
Magnetic recording/recording materials; Magnetrons; Sputtering; Magnetic anisotropy; Magnetic fields; Magnetic films; Magnetic hysteresis; Magnetic shielding; Perpendicular magnetic anisotropy; Perpendicular magnetic recording; Saturation magnetization; Shape; Sputtering;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1984.1063375