Title :
Film growth characterization of an underlayer for perpendicular magnetic recording
Author :
Jhingan, A.K. ; Dubin, R.R. ; Herte, L.F. ; Jhingan, A. ; Dubin, Ran ; Herte, L.
Author_Institution :
Memorex Corporation, Santa Clara, CA, USA
fDate :
9/1/1984 12:00:00 AM
Abstract :
This investigation involves a study of the dependence of the crystal texture of sputtered Ni-Fe films on film thickness and the oxygen content of the sputtering gas. X-ray diffraction, analytical transmission electron microscopy, and scanning auger microprobe analysis have been employed to characterize the films. The
Keywords :
Nickel materials/devices; Sputtering; Crystal microstructure; Crystalline materials; Grain size; Magnetic films; Magnetic materials; Perpendicular magnetic recording; Semiconductor films; Sputtering; Substrates; X-ray diffraction;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.1984.1063378
