DocumentCode :
1005116
Title :
Physical significance of scaling factor used in transport expressions of polycrystalline silicon
Author :
Singh, S.N. ; Singh, Praveen Kumar ; Kishore, Rajalekshmi
Author_Institution :
National Physical Laboratory, Materials Division, New Delhi, India
Volume :
21
Issue :
1
fYear :
1985
Firstpage :
21
Lastpage :
22
Abstract :
The letter discusses the physical significance of the scaling factor S used by many workers in mobility and resistivity expressions for polycrystalline silicon to fit experimental data into their theories. It has been found that the need for this factor arises if the effect of the diffusion mechanism in controlling the majority carriers transport is ignored in preference to thermionic emission mechanism. In general, S<1, and its values of less than unity show that the current transport across the potential barrier is essentially limited by the diffusion mechanism.
Keywords :
carrier mobility; electrical conductivity of crystalline semiconductors and insulators; elemental semiconductors; silicon; current transport; diffusion mechanism; majority carriers transport; mobility; polycrystalline Si; potential barrier; resistivity expressions; scaling factor;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19850017
Filename :
4250819
Link To Document :
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