DocumentCode
1005116
Title
Physical significance of scaling factor used in transport expressions of polycrystalline silicon
Author
Singh, S.N. ; Singh, Praveen Kumar ; Kishore, Rajalekshmi
Author_Institution
National Physical Laboratory, Materials Division, New Delhi, India
Volume
21
Issue
1
fYear
1985
Firstpage
21
Lastpage
22
Abstract
The letter discusses the physical significance of the scaling factor S used by many workers in mobility and resistivity expressions for polycrystalline silicon to fit experimental data into their theories. It has been found that the need for this factor arises if the effect of the diffusion mechanism in controlling the majority carriers transport is ignored in preference to thermionic emission mechanism. In general, S<1, and its values of less than unity show that the current transport across the potential barrier is essentially limited by the diffusion mechanism.
Keywords
carrier mobility; electrical conductivity of crystalline semiconductors and insulators; elemental semiconductors; silicon; current transport; diffusion mechanism; majority carriers transport; mobility; polycrystalline Si; potential barrier; resistivity expressions; scaling factor;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19850017
Filename
4250819
Link To Document