• DocumentCode
    1005116
  • Title

    Physical significance of scaling factor used in transport expressions of polycrystalline silicon

  • Author

    Singh, S.N. ; Singh, Praveen Kumar ; Kishore, Rajalekshmi

  • Author_Institution
    National Physical Laboratory, Materials Division, New Delhi, India
  • Volume
    21
  • Issue
    1
  • fYear
    1985
  • Firstpage
    21
  • Lastpage
    22
  • Abstract
    The letter discusses the physical significance of the scaling factor S used by many workers in mobility and resistivity expressions for polycrystalline silicon to fit experimental data into their theories. It has been found that the need for this factor arises if the effect of the diffusion mechanism in controlling the majority carriers transport is ignored in preference to thermionic emission mechanism. In general, S<1, and its values of less than unity show that the current transport across the potential barrier is essentially limited by the diffusion mechanism.
  • Keywords
    carrier mobility; electrical conductivity of crystalline semiconductors and insulators; elemental semiconductors; silicon; current transport; diffusion mechanism; majority carriers transport; mobility; polycrystalline Si; potential barrier; resistivity expressions; scaling factor;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:19850017
  • Filename
    4250819